发明授权
US4140677A Shaped article of polymers prepared from
(.beta.-hydroxyethyl)-trimellitic acid imide
失效
由({62-羟乙基) - 三聚酸酰亚胺制备的聚合物成型体
- 专利标题: Shaped article of polymers prepared from (.beta.-hydroxyethyl)-trimellitic acid imide
- 专利标题(中): 由({62-羟乙基) - 三聚酸酰亚胺制备的聚合物成型体
-
申请号: US805483申请日: 1977-06-10
-
公开(公告)号: US4140677A公开(公告)日: 1979-02-20
- 发明人: Keiichi Uno , Hikoichi Nagano , Tsuyoshi Hongo , Takahito Miyagawa , Koichi Matsunami
- 申请人: Keiichi Uno , Hikoichi Nagano , Tsuyoshi Hongo , Takahito Miyagawa , Koichi Matsunami
- 申请人地址: JPX Osaka
- 专利权人: Toyo Boseki Kabushiki Kaisha
- 当前专利权人: Toyo Boseki Kabushiki Kaisha
- 当前专利权人地址: JPX Osaka
- 优先权: JPX51-68919 19760611
- 主分类号: B29C49/00
- IPC分类号: B29C49/00 ; B29C55/00 ; B29C55/02 ; C08G73/00 ; C08G73/16 ; C08J5/18 ; D01F6/62 ; D01F6/74
摘要:
A shaped article having a refractive index of not less than 1.625 at least in one direction and possessing excellent physical properties and various uses, which can be prepared by stretching a molded product, which is made of a polymeric material comprising at least 80 mol% of the repeating units of the formula: ##STR1## and having an intrinsic viscosity of not less than 0.25 dl/g when measured in a mixture of phenol and sym.-tetrachloroethane in a weight ratio of 6 : 4 at 30.degree. C. and has a refractive index of not more than 1.610 at least in one direction, at a temperature of 120.degree. to 230.degree. C. with a stretch ratio of 2 to 20 in the same direction as the refractive index is measured, or by melt extruding the polymeric material at a temperature higher than 230.degree. C. and not higher than 360.degree. C. while or immediately followed by stretching with a deformation speed of not less than 20 times the speed of the melt extrusion.
公开/授权文献
- US5985045A Process for polishing a semiconductor substrate 公开/授权日:1999-11-16
信息查询