发明授权
US4161404A Photosensitive material for use in electrophotography with a poly alkyl or benzyl glutamate 失效
用于与聚烷基或苄基谷氨酸的电子照相的感光材料

  • 专利标题: Photosensitive material for use in electrophotography with a poly alkyl or benzyl glutamate
  • 专利标题(中): 用于与聚烷基或苄基谷氨酸的电子照相的感光材料
  • 申请号: US840276
    申请日: 1977-10-07
  • 公开(公告)号: US4161404A
    公开(公告)日: 1979-07-17
  • 发明人: Takamichi EnomotoSeiiti Sakuma
  • 申请人: Takamichi EnomotoSeiiti Sakuma
  • 申请人地址: JPX Tokyo
  • 专利权人: Ricoh Co., Ltd.
  • 当前专利权人: Ricoh Co., Ltd.
  • 当前专利权人地址: JPX Tokyo
  • 优先权: JPX51-122661 19761013
  • 主分类号: G03G5/14
  • IPC分类号: G03G5/14
Photosensitive material for use in electrophotography with a poly alkyl
or benzyl glutamate
摘要:
The present invention provides a photosensitive material for use in electrophotography which is prepared by forming a barrier layer containing a peptide polymer between a conductive support and a photosensitive layer. This photosensitive material impedes unnecessary charge infiltration through the conductive support, maintains an appropriate charge acceptability, imparts an adhesive property of the photosensitive layer in relation to the support or flexibility of the photosensitive material, and prevents deterioration of such characteristics as photosensitivity, residual potential, etc. When some acceptor or donor is additionally mixed in said barrier layer, the electrification property thereof is improved.
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