发明授权
- 专利标题： Electrophotosensitive materials for migration imaging processes
- 专利标题（中）： 用于迁移成像过程的电光敏材料
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申请号： US909245申请日： 1978-05-24
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公开(公告)号： US4165985A公开(公告)日： 1979-08-28
- 发明人: James R. Nonnemacher , Michael T. Regan , Frank G. Webster
- 申请人： James R. Nonnemacher , Michael T. Regan , Frank G. Webster
- 申请人地址： NY Rochester
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： NY Rochester
- 主分类号： C09K3/00
- IPC分类号： C09K3/00 ; G02F1/167 ; G03G5/00 ; G03G9/12 ; G03G17/04 ; G03G13/24
摘要：
Electrophotosensitive materials having the structure ##STR1## wherein R represents a basic heterocyclic nucleus as well as groups such as hydrogen, alkyl, aryl, aralkyl, etc.;A.sub.1 represents a wide variety of basic heterocyclic nuclei;A.sub.2 represents aryl or may be the same as A.sub.1 ;G represents O or S;M is 0 to 3;N is 0 to 1; andL.sup.1, l.sup.2, l.sup.3, l.sup.4 and L.sup.5 represent hydrogen, alkyl or aryl.
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