发明授权
- 专利标题： Method of fabricating three-dimensional epitaxial layers utilizing molecular beams of varied angles
- 专利标题（中）： 利用不同角度的分子束制造三维外延层的方法
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申请号： US815303申请日： 1977-07-13
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公开(公告)号： US4171234A公开(公告)日： 1979-10-16
- 发明人: Seiichi Nagata , Tsuneo Tanaka , Masakazu Fukai
- 申请人： Seiichi Nagata , Tsuneo Tanaka , Masakazu Fukai
- 申请人地址： JPX Osaka
- 专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址： JPX Osaka
- 优先权： JPX51-86736 19760720; JPX51-118126 19760930
- 主分类号： C30B23/02
- IPC分类号： C30B23/02 ; C30B23/04 ; H01L21/203 ; H01L29/06
摘要：
Three-dimensional structures having a suitable geometrical configuration are directly formed on one major surface of a substrate so that an epitaxial molecular beam may be incident on preselected regions, and the angles of incidence of epitaxial molecular beams are varied. As a result the arrival rates of molecular beams are varied from one region to another on the substrate so that a three-dimensional epitaxial layer in which the physical properties are different from one region of a submicron across to another may be grown.
公开/授权文献
- US5845989A Integral spare bulb container for halogen work light 公开/授权日：1998-12-08
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