发明授权
- 专利标题: Light-sensitive silver halide photographic material containing tetrazolium compounds
- 专利标题(中): 含有四唑化合物的感光卤化银照相材料
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申请号: US16988申请日: 1979-03-02
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公开(公告)号: US4233400A公开(公告)日: 1980-11-11
- 发明人: Mitsuto Fujiwhara , Syunji Matsuo , Toyoaki Masukawa , Yutaka Kaneko , Mikio Kawasaki
- 申请人: Mitsuto Fujiwhara , Syunji Matsuo , Toyoaki Masukawa , Yutaka Kaneko , Mikio Kawasaki
- 申请人地址: JPX Nihonbashi-muromachi
- 专利权人: Konishiroku Photo Industry Co., Ltd.
- 当前专利权人: Konishiroku Photo Industry Co., Ltd.
- 当前专利权人地址: JPX Nihonbashi-muromachi
- 优先权: JPX50-94295 19750802
- 主分类号: G03C5/29
- IPC分类号: G03C5/29 ; G03C1/06 ; G03C1/02
摘要:
Light-sensitive silver halide photographic materials to be treated with a hydroquinones-containing developing solution which material comprises a support and at least one hydrophilic colloidal layer coated thereon containing silver halide grains having an average grain size of 0.05 to 1.5.mu. and a tetrazolium compound and a method of processing thereof.
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