发明授权
- 专利标题： Disazo compounds, process for preparation of same and application of said disazo compounds and analogues thereof to electrophotographic sensitive materials
- 专利标题（中）： 双偶氮化合物，其制备方法和所述双偶氮化合物及其类似物应用于电子照相感光材料
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申请号： US908116申请日： 1978-05-22
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公开(公告)号： US4251613A公开(公告)日： 1981-02-17
- 发明人: Masaomi Sasaki , Kiyoshi Sakai , Mitsuru Hashimoto , Masafumi Ohta , Kyoji Tsutsui
- 申请人： Masaomi Sasaki , Kiyoshi Sakai , Mitsuru Hashimoto , Masafumi Ohta , Kyoji Tsutsui
- 申请人地址： JPX Tokyo
- 专利权人： Ricoh Company, Ltd.
- 当前专利权人： Ricoh Company, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX52-66711 19770608; JPX52-68182 19770609; JPX52-72205 19770620; JPX52-77155 19770630
- 主分类号： C09B35/02
- IPC分类号： C09B35/02 ; G03G5/06 ; G03G13/22
摘要：
The present invention provides disazo compounds expressed by the general formula I ##STR1## a process for the preparation of said compounds; and electrophotographic sensitive material having a high sensitivity as well as a high flexibility which comprise a conductive support and a photosensitive layer formed thereon, said photosensitive layer containing a disazo compound, as an effective ingredient, which is expressed by the general formula II A'--N.dbd.N--Z--N.dbd.N--A'.
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