发明授权
US4272196A Optical sizing mask and process 失效
光学尺寸面膜和工艺

  • 专利标题: Optical sizing mask and process
  • 专利标题(中): 光学尺寸面膜和工艺
  • 申请号: US3027
    申请日: 1979-01-12
  • 公开(公告)号: US4272196A
    公开(公告)日: 1981-06-09
  • 发明人: Guy Indebetouw
  • 申请人: Guy Indebetouw
  • 申请人地址: CHX Thun
  • 专利权人: Lasag S.A.
  • 当前专利权人: Lasag S.A.
  • 当前专利权人地址: CHX Thun
  • 主分类号: G01B11/06
  • IPC分类号: G01B11/06 G01B11/25 G01B11/30
Optical sizing mask and process
摘要:
A process and mask for use in the process making it possible optically to measure precisely and rapidly sizes in elevation. A group of fringes of regular light, in uniform translation at constant velocity, is projected on the object to be measured and the image of the projected fringes is observed. The measurement of the phase difference of the reflected or diffused light signal at two points of the masked image plane is proportional to a variation in the relative height of the two corresponding object points, thereby allowing comparison to a control piece. The process makes it possible to measure absolute or relative sizes in elevation at two critical points of pieces in a production line. It also makes it possible to determine the profile of any piece.
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