发明授权
US4278380A Lock and elevator arrangement for loading workpieces into the work
chamber of an electron beam lithography system
失效
用于将工件加载到电子束光刻系统的工作室中的锁定和升降机装置
- 专利标题： Lock and elevator arrangement for loading workpieces into the work chamber of an electron beam lithography system
- 专利标题（中）： 用于将工件加载到电子束光刻系统的工作室中的锁定和升降机装置
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申请号： US34504申请日： 1979-04-30
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公开(公告)号： US4278380A公开(公告)日： 1981-07-14
- 发明人: Nicholas Guarino
- 申请人： Nicholas Guarino
- 申请人地址： CA Palo Alto
- 专利权人： Varian Associates, Inc.
- 当前专利权人： Varian Associates, Inc.
- 当前专利权人地址： CA Palo Alto
- 主分类号： H01J37/18
- IPC分类号： H01J37/18 ; H01L21/00 ; H01L21/677 ; B65B21/02
摘要：
In apparatus having a work chamber in which workpieces are treated under high vacuum, that improvement comprising an inner chamber having a capacity for a plurality of workpieces, an outer chamber, vacuum means for evacuating the inner and outer chambers, a first valve for sealing between the work chamber and the inner chamber, a second valve for sealing between the inner and outer chambers, a third valve for sealing between the outer chamber and the atmosphere, loading means for loading workpieces through the third valve into the outer chamber from the atmosphere, and transfer means for transferring individual workpieces through the second valve between the inner and outer chambers, and for transferring individual workpieces through the first valve between the inner chamber and the work chamber.
公开/授权文献
- US5933661A Optical apparatus having the image blur correcting function 公开/授权日：1999-08-03
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