发明授权
- 专利标题: Electrophotographic elements containing trisazo compounds
- 专利标题(中): 含有三偶氮化合物的电子照相元件
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申请号: US897508申请日: 1978-04-18
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公开(公告)号: US4279981A公开(公告)日: 1981-07-21
- 发明人: Masafumi Ohta , Kiyoshi Sakai , Mitsuru Hashimoto , Akio Kozima , Masaomi Sasaki
- 申请人: Masafumi Ohta , Kiyoshi Sakai , Mitsuru Hashimoto , Akio Kozima , Masaomi Sasaki
- 申请人地址: JPX Tokyo
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX52/45812 19770422; JPX52/46859 19770425
- 主分类号: C09B35/378
- IPC分类号: C09B35/378 ; G03G5/06
摘要:
The present invention provides trisazo compounds expressed by the general formula I ##STR1## [wherein A represents ##STR2## (wherein R represents hydrogen, alkyl radical, alkoxy radical, nitro radical, dialkylamino radical or halogen, and n is an integer of 1, 2 or 3, R may be either identical or different when n is an integer of 2 or 3)]; a process for the preparation of said trisazo compounds; and electrophotographic sensitive materials having a high sensitivity as well as a high flexibility which comprise a conductive support and a photosensitive layer containing a trisazo compound, as an effective ingredient thereof, which is expressed by the general formula II ##STR3## [wherein A' represents ##STR4## (wherein Z represents aromatic rings such as benzene ring, naphthalene ring, etc., hetero rings such as indole ring, carbazole ring, benzofuran ring, etc. or their substituents, Ar.sub.1 represents aromatic rings such as benzene ring, naphthalene ring, etc., hetero rings such as dibenzofuran ring, etc. or their substituents, Ar.sub.2 and Ar.sub.3 represent aromatic rings such as benzene ring, naphthalene ring, etc. or their substituents, R.sub.1 and R.sub.3 represent hydrogen, lower alkyl radical, phenyl radical or their substituents, and R.sub.2 represents lower alkyl radical, carboxyl radical or their esters)].
公开/授权文献
- US5938920A Filter plate assembly for horizontal-type filter press 公开/授权日:1999-08-17
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