Cadmium electroplating baths are described which contain at least one thiourea compound having the general formula:[R.sub.2 N].sub.2 CS (I)wherein each R is independently hydrogen or an alkyl, alkenyl or aryl group. The baths also can contain at least one phosphate, carboxylate, sulfonate or sulfate compound containing one or more alkylene oxide groups containing 2 or 3 carbon atoms and wherein at least one of the alkylene oxide groups in the sulfates is attached to an aryl group, and at least one organic brightener compound and particularly non-sulfur containing compounds such as pyridine brightener compounds.