发明授权
- 专利标题: Method of stabilizing organic substrate materials to light
- 专利标题(中): 稳定有机基板材料的方法
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申请号: US151081申请日: 1980-05-19
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公开(公告)号: US4301223A公开(公告)日: 1981-11-17
- 发明人: Kotaro Nakamura , Yoshiaki Suzuki , Hiroshi Hara , Satoru Sawada , Shigeru Oono
- 申请人: Kotaro Nakamura , Yoshiaki Suzuki , Hiroshi Hara , Satoru Sawada , Shigeru Oono
- 申请人地址: JPX Minami-ashigara
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Minami-ashigara
- 优先权: JPX54-60728 19790517
- 主分类号: G03C7/26
- IPC分类号: G03C7/26 ; C08K5/00 ; C09B67/00 ; G03C1/06 ; G03C1/83 ; G03C7/392 ; G03C7/00
摘要:
A method is described for stabilizing organic substrate materials having an absorption maximum in the range of from about 300 nm to 800 nm to light which comprises making at least one complex represented by the formula (I) coexist with the organic substrate materials in an amount effective to stabilize said organic substrate material: ##STR1## wherein M represents copper, cobalt, nickel, palladium or platinum, and R.sup.1 and R.sup.2 independently represent a hydrogen atom, an alkyl group, an aryl group, an acyl group, an N-alkylcarbamoyl group, an N-arylcarbamoyl group, or an N-alkylsulfamoyl group, an N-arylsulfamoyl group, an alkoxycarbonyl group or an aryloxycarbonyl group.
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