发明授权
- 专利标题: Electrophotographic sensitive materials containing disazo compounds
- 专利标题(中): 含有双偶氮化合物的电子照相感光材料
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申请号: US218382申请日: 1980-12-19
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公开(公告)号: US4314015A公开(公告)日: 1982-02-02
- 发明人: Mitsuru Hashimoto , Kiyoshi Sakai , Masafumi Ohta , Akio Kozima , Masaomi Sasaki , Kyoji Tsutsui
- 申请人: Mitsuru Hashimoto , Kiyoshi Sakai , Masafumi Ohta , Akio Kozima , Masaomi Sasaki , Kyoji Tsutsui
- 申请人地址: JPX Tokyo
- 专利权人: Ricoh Co., Ltd.
- 当前专利权人: Ricoh Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX52-84976 19770718; JPX52-84977 19770718; JPX52-86255 19770719; JPX52-87351 19770722
- 主分类号: C09B35/02
- IPC分类号: C09B35/02 ; C09B35/039 ; G03G5/06
摘要:
The present invention provides electrophotographic sensitive materials having a high sensitivity as well as a high flexibility which comprise a conductive support and a photosensitive layer formed thereon, said photosensitive layer containing one disazo pigment, as an effective ingredient, which is selected from the group consisting of disazo pigments expressed by the following general formulas I, II, III, and IV, ##STR1## [(wherein A is selected from the group consisting of ##STR2## is selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc., hetero rings such as indole ring, carbazole ring, benzofuran ring, etc. and their substituents, Ar.sub.1 is selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc., hetero rings such as dibenzofuran, etc. and their substituents, Ar.sub.2 and Ar.sub.3 are selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc. and their substituents, R.sub.1 and R.sub.3 are selected from the group consisting of hydrogen, lower alkyl radical or phenyl radical and their substituents and R.sub.2 is selected from the group consisting of lower alkyl radical, carboxyl radical and their esters)].
公开/授权文献
- US5572210A Digital signal processing apparatus 公开/授权日:1996-11-05
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