发明授权
- 专利标题: Gas laser device
- 专利标题(中): 气体激光装置
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申请号: US201064申请日: 1980-02-06
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公开(公告)号: US4331939A公开(公告)日: 1982-05-25
- 发明人: Kouji Kuwabara , Hiroyuki Sugawara , Toshiharu Shirakura , Kouji Sasaki , Satoshi Takemori
- 申请人: Kouji Kuwabara , Hiroyuki Sugawara , Toshiharu Shirakura , Kouji Sasaki , Satoshi Takemori
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX53-102893 19780825
- 主分类号: H01S3/036
- IPC分类号: H01S3/036 ; H01S3/038 ; H01S3/097 ; H01S3/08
摘要:
An invention concerning the electrode structure of a gas laser device is disclosed. In the outer peripheral part of a discharge gas circulating hole (32) provided in the central part of an upper gas stream side one (16) of electrodes (14) and (16) disposed at both the ends of a discharge tube (8), a plurality of gas circulating apertures (34) are further provided over the entire periphery. A glow discharge portion in the discharge tube (8) is fined towards the central part of the tube by a gas which passes through the outer-peripheral gas circulating apertures (34). Thus, the laser intensity profile becomes the Gaussian distribution, and the laser generation efficiency is enhanced.
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