发明授权
US4332473A Apparatus for detecting a mutual positional relationship of two sample members 失效
用于检测两个样品构件的相互位置关系的装置

  • 专利标题: Apparatus for detecting a mutual positional relationship of two sample members
  • 专利标题(中): 用于检测两个样品构件的相互位置关系的装置
  • 申请号: US114354
    申请日: 1980-01-22
  • 公开(公告)号: US4332473A
    公开(公告)日: 1982-06-01
  • 发明人: Akira Ono
  • 申请人: Akira Ono
  • 申请人地址: JPX Kawasaki
  • 专利权人: Tokyo Shibaura Denki Kabushiki Kaisha
  • 当前专利权人: Tokyo Shibaura Denki Kabushiki Kaisha
  • 当前专利权人地址: JPX Kawasaki
  • 优先权: JPX54-10080 19790131; JPX54-38614 19790331
  • 主分类号: G01D5/38
  • IPC分类号: G01D5/38 G01B9/02
Apparatus for detecting a mutual positional relationship of two sample
members
摘要:
An apparatus for detecting a mutual positional relationship of a semiconductor wafer and mask comprises first and second diffraction gratings formed on the wafer and mask and located parallel to each other; a laser source for radiating a coherent light vertically toward the first and second diffraction gratings; a drive mechanism for periodically varying a relative distance between the first and second diffraction gratings; a pair of photosensors for receiving a first interference beam resulting from those +n-order diffracted beams included in said diffracted beams and a second interference beam resulting from those -n-order diffracted beams included in said diffracted beams; and a differential amplifier calculating the difference between the intensities of the first and second interference lights thereby detecting a mutual positional displacement between the first and second diffraction grating.
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