发明授权
US4332473A Apparatus for detecting a mutual positional relationship of two sample
members
失效
用于检测两个样品构件的相互位置关系的装置
- 专利标题: Apparatus for detecting a mutual positional relationship of two sample members
- 专利标题(中): 用于检测两个样品构件的相互位置关系的装置
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申请号: US114354申请日: 1980-01-22
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公开(公告)号: US4332473A公开(公告)日: 1982-06-01
- 发明人: Akira Ono
- 申请人: Akira Ono
- 申请人地址: JPX Kawasaki
- 专利权人: Tokyo Shibaura Denki Kabushiki Kaisha
- 当前专利权人: Tokyo Shibaura Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX54-10080 19790131; JPX54-38614 19790331
- 主分类号: G01D5/38
- IPC分类号: G01D5/38 ; G01B9/02
摘要:
An apparatus for detecting a mutual positional relationship of a semiconductor wafer and mask comprises first and second diffraction gratings formed on the wafer and mask and located parallel to each other; a laser source for radiating a coherent light vertically toward the first and second diffraction gratings; a drive mechanism for periodically varying a relative distance between the first and second diffraction gratings; a pair of photosensors for receiving a first interference beam resulting from those +n-order diffracted beams included in said diffracted beams and a second interference beam resulting from those -n-order diffracted beams included in said diffracted beams; and a differential amplifier calculating the difference between the intensities of the first and second interference lights thereby detecting a mutual positional displacement between the first and second diffraction grating.
公开/授权文献
- USD433226S Front panel of a receptacle 公开/授权日:2000-11-07