Invention Grant
US4334004A Light-sensitive diazotype material with 2-hydroxy-3-naphthoic acid
amides having 6-sulfonic acid amide substitution
失效
具有6-磺酰胺取代的2-羟基-3-萘甲酰胺的光敏二氮型材料
- Patent Title: Light-sensitive diazotype material with 2-hydroxy-3-naphthoic acid amides having 6-sulfonic acid amide substitution
- Patent Title (中): 具有6-磺酰胺取代的2-羟基-3-萘甲酰胺的光敏二氮型材料
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Application No.: US21104Application Date: 1979-03-16
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Publication No.: US4334004APublication Date: 1982-06-08
- Inventor: Siegfried Scheler
- Applicant: Siegfried Scheler
- Applicant Address: DEX
- Assignee: Hoechst Aktiengesellschaft
- Current Assignee: Hoechst Aktiengesellschaft
- Current Assignee Address: DEX
- Priority: DEX2811981 19780318
- Main IPC: C09B29/20
- IPC: C09B29/20 ; C07C67/00 ; C07C301/00 ; C07C311/29 ; C07D295/13 ; C07D295/22 ; C07D295/26 ; C09B29/34 ; G03C1/58 ; G03C1/54
Abstract:
This invention relates to 2-hydroxy-3-naphthoic acid amides of the general formula: ##STR1## wherein R.sub.1 is hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, and R.sub.2 and R.sub.3 are identical or different and are hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, or, together with the nitrogen atom to which they are attached, a substituted or unsubstituted heterocyclic group.
Public/Granted literature
- USD364408S Wheel loader vehicle Public/Granted day:1995-11-21
Information query
