发明授权
- 专利标题: Surface acoustic wave device
- 专利标题(中): 表面声波装置
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申请号: US235751申请日: 1981-02-18
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公开(公告)号: US4342012A公开(公告)日: 1982-07-27
- 发明人: Ritsuo Inaba , Kiyotaka Wasa
- 申请人: Ritsuo Inaba , Kiyotaka Wasa
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX55/20267 19800219
- 主分类号: H03H9/25
- IPC分类号: H03H9/25 ; H03H3/08 ; H03H9/02 ; H03H9/42 ; H01L41/18 ; H03B5/32 ; H03H9/64
摘要:
A surface acoustic wave device in which an X-cut LiTaO.sub.3 single crystal substrate has its one major surface coated with a SiO.sub.2 film and the direction of propagation of surface acoustic waves is selected between 80.degree. and 180.degree. measured from the Y-axis toward the Z-axis. The surface acoustic wave devices in accordance with the present invention has an extremely low temperature coefficient change and a high electro-mechanical coupling coefficient, exhibits a higher degree of both short- and long-term stability, and can suppress the generation of unwanted waves to a minimum or negligible degree.
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