发明授权
- 专利标题: Heat-developable photosensitive material with antihalation layer
- 专利标题(中): 具有防晕层的热显影感光材料
-
申请号: US313705申请日: 1981-10-19
-
公开(公告)号: US4376162A公开(公告)日: 1983-03-08
- 发明人: Ken Kawata , Isamu Itoh , Misao Awata , Takao Masuda
- 申请人: Ken Kawata , Isamu Itoh , Misao Awata , Takao Masuda
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX55-145344 19801017
- 主分类号: G03C1/498
- IPC分类号: G03C1/498 ; G03C1/825 ; G03C1/74
摘要:
A heat-developable photosensitive material is disclosed having a high image sharpness. The material is comprised of a heat-developable photosensitive layer which includes an organic silver salt, a photocatalyst, and a reducing agent. An antihalation layer is provided on the opposite face of the material with respect to the side intended for imagewise exposure. The antihalation layer contains a photosensitive halogen-containing compound which reduces the pH of the antihalation layer by photolysis and is colored with a dye which causes a change of color when the pH of the antihalation layer is reduced.
公开/授权文献
- US4993888A Cutting tool arrangement 公开/授权日:1991-02-19
信息查询