发明授权
- 专利标题： Novel diorganopolysiloxane compounds
- 专利标题（中）： 新型二有机聚硅氧烷化合物
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申请号： US267542申请日： 1981-05-27
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公开(公告)号： US4384100A公开(公告)日： 1983-05-17
- 发明人: Minoru Takamizawa , Shigeo Kimura , Masashi Somezawa , Kunio Kobayashi , Yoshio Inoue , Hiroshi Yoshioka
- 申请人： Minoru Takamizawa , Shigeo Kimura , Masashi Somezawa , Kunio Kobayashi , Yoshio Inoue , Hiroshi Yoshioka
- 申请人地址： JPX Tokyo JPX Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.,Sony Corporation
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.,Sony Corporation
- 当前专利权人地址： JPX Tokyo JPX Tokyo
- 优先权： JPX55-71032 19800528
- 主分类号： C08G77/00
- IPC分类号： C08G77/00 ; B29C33/64 ; C08G77/22 ; C08G77/24 ; C08G77/38 ; C08G77/385 ; C10M107/50 ; G11B5/71 ; G11B5/73
摘要：
The invention provides a novel diorganopolysiloxane compound composed of dimethysiloxane units, methyl (2-perfluoroalkylethyl)siloxane units and methyl acyloxyalkylsiloxane units. The novel diorganopolysiloxane compounds of the invention have excellent lubricating properties so that they are useful as an additive ingredient in various materials such as coating compositions, magnetic layer of recording tapes and the like where lubricity or mold releasability is essential.
公开/授权文献
- US5518552A Method for scrubbing and cleaning substrate 公开/授权日：1996-05-21
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