发明授权
- 专利标题: Terraced substrate semiconductor laser
- 专利标题(中): 梯形衬底半导体激光器
-
申请号: US224821申请日: 1981-01-13
-
公开(公告)号: US4392227A公开(公告)日: 1983-07-05
- 发明人: Kunio Itoh , Takashi Sugino , Masaru Wada , Hirokazu Shimizu
- 申请人: Kunio Itoh , Takashi Sugino , Masaru Wada , Hirokazu Shimizu
- 申请人地址: JPX Kadoma
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Kadoma
- 优先权: JPX55-2777 19800114; JPX55-13159 19800205; JPX55-20256 19800219; JPX55-32981 19800314; JPX55-35292 19800319; JPX55-35293 19800319; JPX55-35296 19800319; JPX55-65555 19800516
- 主分类号: H01S5/20
- IPC分类号: H01S5/20 ; H01S5/223 ; H01S5/32 ; H01S5/323 ; H01S3/19
摘要:
In a terraced substrate type semiconductor laser comprising a semiconductor substrate (11) having a step (T) on its principal face, an active layer (13) with an oblique central region (131), defined between two bendings, as stripe-shaped lasing region near the foot of the step part (T) of the substrate (11), and a clad layer (14) formed on the active layer (13),The device is characterized by comprising a current injection region (22) which is formed by diffusing an impurity, in a manner that a diffusion front corner (221) penetrate the clad layer (14) and contacts the oblique lasing region (131) thereby to form the current injection path (221) very narrow and closely to the central part of the stripe-shaped lasing region (13), thereby effectively confining the injected current to the lasing region (131) and hence attaining very low threshold current and very high external differential quantum efficiency.
公开/授权文献
- US5381310A Sheet-illuminating system 公开/授权日:1995-01-10
信息查询