发明授权
- 专利标题: X-Ray field defining mask
- 专利标题(中): X射线场定义掩模
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申请号: US440618申请日: 1982-11-10
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公开(公告)号: US4476569A公开(公告)日: 1984-10-09
- 发明人: Yoshimasa Ogo
- 申请人: Yoshimasa Ogo
- 申请人地址: JPX Kawasaki
- 专利权人: Tokyo Shibaura Denki Kabushiki Kaisha
- 当前专利权人: Tokyo Shibaura Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX57-11207 19820127
- 主分类号: G21F3/00
- IPC分类号: G21F3/00 ; G03B42/02 ; G21K1/02 ; A61B6/00
摘要:
In a spot film device, a cassette assembly for a film cassette is mounted for reciprocating in a tunnel between an X-ray exposure position and a position in which the cassette is automatically unloaded or loaded with film. Field defining masks are also mounted for translating selectively with the carriage. The masks are formed of the synthetic materials having minimal X-ray absorption and high rigidity, without an aperture, to define a sharp X-ray field.
公开/授权文献
- USD327130S Combined car wash and lighted archway 公开/授权日:1992-06-16