发明授权
- 专利标题: Lettering machine
- 专利标题(中): 刻字机
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申请号: US529677申请日: 1983-09-06
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公开(公告)号: US4493152A公开(公告)日: 1985-01-15
- 发明人: Osamu Ono
- 申请人: Osamu Ono
- 申请人地址: JPX Tokyo
- 专利权人: Nakuru Inc.
- 当前专利权人: Nakuru Inc.
- 当前专利权人地址: JPX Tokyo
- 主分类号: B43L13/10
- IPC分类号: B43L13/10
摘要:
A lettering machine is disclosed, which comprises a tracer support mechanism supporting a tracer at a corner such that the tracer can be freely moved to trace a letter or the like engraved on a tracing plate, a parallelogrammic horizontal component transmission mechanism via an inclination angle setting mechanism and capable of transmitting only the horizontal component of the tracing motion of the tracer on an equal scale, an enlarged scale or a reduced scale and/or a preset inclination angle, a parallelogrammic vertical component transmission mechanism coupled to the tracer support mechanism and capable of transmitting only the vertical component of the tracing motion of the tracer on an equal scale, an enlarged scale or a reduced scale, a resultant motion reproducing mechanism coupled to the parallelogrammic horizontal and vertical component transmission mechanisms and capable of combining the horizontal and vertical components of tracer motion transmitted from the respective transmission mechanisms to reproduce the tracer motion on an equal scale, an enlarged scale or a reduced scale and/or the preset inclination angle, and a writing tool support mechanism coupled to the reproducing mechanism and capable of supporting a writing tool at a free end. With this lettering machine, it is possible to write letters on horizontally and/or vertically enlarged or reduced scales and also with desired inclination angles as well as ordinary equal scale letters.
公开/授权文献
- US5028782A Method of adjusting image processing conditions 公开/授权日:1991-07-02
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