发明授权
- 专利标题: Substrate loading means for a chemical vapor deposition apparatus
- 专利标题(中): 用于化学气相沉积装置的基板装载装置
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申请号: US529415申请日: 1983-09-06
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公开(公告)号: US4524719A公开(公告)日: 1985-06-25
- 发明人: Bryant A. Campbell , Dale R. DuBois , Ralph F. Manriquez , Nicholas E. Miller
- 申请人: Bryant A. Campbell , Dale R. DuBois , Ralph F. Manriquez , Nicholas E. Miller
- 申请人地址: CA San Jose
- 专利权人: Anicon, Inc.
- 当前专利权人: Anicon, Inc.
- 当前专利权人地址: CA San Jose
- 主分类号: C23C16/48
- IPC分类号: C23C16/48 ; C23C16/54 ; C23C13/08
摘要:
A controlled temperature deposition device comprising an inner reaction chamber having gas distribution means for introducing gas into inner chamber and removing gas therefrom and a vacuum chamber means surrounding the inner deposition chamber and spaced from the walls thereof for maintaining a medium vacuum therein. Associated with the deposition device is a substrate loading and unloading fork which transfers substrates such as wafer boats from outside the device to a position in the inner deposition chamber and removes them from the inner deposition chamber following deposition.