发明授权
- 专利标题： Method and apparatus for performing deep UV photolithography
- 专利标题（中）： 用于进行深紫外光刻的方法和装置
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申请号： US362825申请日： 1982-03-29
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公开(公告)号： US4532427A公开(公告)日： 1985-07-30
- 发明人: John C. Matthews , Michael G. Ury , Charles H. Wood , Marshal Greenblatt
- 申请人： John C. Matthews , Michael G. Ury , Charles H. Wood , Marshal Greenblatt
- 申请人地址： MD Rockville
- 专利权人： Fusion Systems Corp.
- 当前专利权人： Fusion Systems Corp.
- 当前专利权人地址： MD Rockville
- 主分类号： F21S2/00
- IPC分类号： F21S2/00 ; G03F7/20 ; H01J65/04 ; H01L21/027
摘要：
A method and apparatus for performing deep UV photolithography which utilizes a microwave generated electrodeless light source for producing deep UV radiation. This results in faster semiconductor exposure times and less system downtime for changing failed bulbs as well as other advantages which are detailed herein.
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