发明授权
- 专利标题: Method of surface treatment
- 专利标题(中): 表面处理方法
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申请号: US611420申请日: 1984-05-17
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公开(公告)号: US4569717A公开(公告)日: 1986-02-11
- 发明人: Nobutoshi Ohgami , Masaru Kitagawa , Hisao Nishizawa , Masakazu Saita
- 申请人: Nobutoshi Ohgami , Masaru Kitagawa , Hisao Nishizawa , Masakazu Saita
- 申请人地址: JPX Kyoto
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JPX Kyoto
- 优先权: JPX58-92176 19830524; JPX58-188035 19831006
- 主分类号: C23F4/00
- IPC分类号: C23F4/00 ; G03F1/68 ; G03F1/84 ; G01T1/185 ; H01L21/306
摘要:
In a method of surface treatment irradiating a part of a plate to be treated with light flux, detecting a quantity of transmitted light or reflected light on the plate corresponding to the light flux, detecting an end point of surface treatment based on the variation in the detected signal level the combination with the method of a step of detecting whether the detected signal level exceeds a predetermined target level within a predetermined period of time, a step of repeatedly setting up a new target level so long as the detected level is found exceeding the predetermined target level, and a step of determining the end point of the surface treatment at the moment when the detected signal level is found not exceeding the new target level.
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