发明授权
- 专利标题： Pattern forming method
- 专利标题（中）： 图案形成方法
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申请号： US702217申请日： 1985-02-15
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公开(公告)号： US4586980A公开(公告)日： 1986-05-06
- 发明人: Yutaka Hirai , Yoshinori Tomida , Hiroshi Matsuda , Yukuo Nishimura
- 申请人： Yutaka Hirai , Yoshinori Tomida , Hiroshi Matsuda , Yukuo Nishimura
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX59-28793 19840220
- 主分类号： H01L21/306
- IPC分类号： H01L21/306 ; B05D1/20 ; B44C1/22 ; C23F1/02 ; G03F7/26 ; H01L21/027 ; H01L21/205 ; H01L27/142 ; H01L51/30 ; H01L51/42 ; C23F1/00 ; C03C15/00
摘要：
A pattern of a monomolecular film or a monomolecular built-up film is formed on a base through the steps of providing a lift-off layer on a base on which a monomolecular film or a monomolecular built-up film is to be deposited, depositing the monomolecular film or the monomolecular built-up film on the base and the lift-off layer, and removing the lift-off layer from the base.
公开/授权文献
- US5871599A Low-noise pneumatic tires with specified carcass line 公开/授权日：1999-02-16
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