Invention Grant
- Patent Title: Geometric LED layout for line exposure
- Patent Title (中): 用于线路曝光的几何LED布局
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Application No.: US695072Application Date: 1985-01-25
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Publication No.: US4589745APublication Date: 1986-05-20
- Inventor: William T. Plummer
- Applicant: William T. Plummer
- Applicant Address: MA Cambridge
- Assignee: Polaroid Corporation
- Current Assignee: Polaroid Corporation
- Current Assignee Address: MA Cambridge
- Main IPC: H01L33/00
- IPC: H01L33/00 ; B41J2/45 ; G03B27/50 ; H04N1/036 ; H04N1/193 ; G03B41/00
Abstract:
A line exposure array of light emitting diodes arranged in spaced apart relationship with respect to each other along the longitudinal axis thereof and geometrically configured to provide a substantially uniform exposure of a photosensitive material without underexposed stripes appearing on those areas of the photosensitive material immediately adjacent the spaces between the light emitting diodes.
Public/Granted literature
- US4051015A Hydroconversion of heavy hydrocarbons using copper chloride catalyst Public/Granted day:1977-09-27
Information query
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