发明授权
- 专利标题： Production method of a high magnetic permeability film
- 专利标题（中）： 高磁导率膜的制造方法
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申请号： US664425申请日： 1984-10-24
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公开(公告)号： US4592923A公开(公告)日： 1986-06-03
- 发明人: Masaru Kadono , Kumio Nago , Shuuhei Tsuchimoto , Mitsuhiko Yoshikawa
- 申请人： Masaru Kadono , Kumio Nago , Shuuhei Tsuchimoto , Mitsuhiko Yoshikawa
- 申请人地址： JPX Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JPX Osaka
- 优先权： JPX58-199727 19831024; JPX59-181292 19840828; JPX59-182087 19840829
- 主分类号： C23C14/14
- IPC分类号： C23C14/14 ; B05D3/06
摘要：
A method for producing a high magnetic permeability alloy film, wherein an alloy material composed of 1-6 wt % Al, 20-35 wt % Si and the remainder of iron is irradiated with an electron beam in a vacuum deposition apparatus equipped with an electron gun, and the vapor of the alloy material is deposited on a substrate for a predetermined time to form a high magnetic permeability alloy film, comprising further a step of preventing the irregular deposition caused if the concentration of aluminum in the vapor to be deposited increases.
公开/授权文献
- US5041994A Data storage system and method for a laser printer 公开/授权日：1991-08-20
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