发明授权
- 专利标题： 2-cyano-4-halogenophenyl esters
- 专利标题（中）： 2-氰基-4-卤代苯基酯
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申请号： US530786申请日： 1983-09-09
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公开(公告)号： US4603018A公开(公告)日： 1986-07-29
- 发明人: Shigeru Sugimori , Toyoshiro Isoyama , Tetsuhiko Kojima , Yasuyuki Goto
- 申请人： Shigeru Sugimori , Toyoshiro Isoyama , Tetsuhiko Kojima , Yasuyuki Goto
- 申请人地址： JPX Osaka
- 专利权人： Chisso Corporation
- 当前专利权人： Chisso Corporation
- 当前专利权人地址： JPX Osaka
- 优先权： JPX57-168174 19820927; JPX57-203492 19821119; JPX58-8896 19830122; JPX58-9646 19830124; JPX58-34224 19830302; JPX58-43596 19830316; JPX58-62417 19830409; JPX58-97284 19830601
- 主分类号： C07C255/51
- IPC分类号： C07C255/51 ; C07C255/53 ; C09K19/00 ; C09K19/20 ; C09K19/30 ; C07C121/60
摘要：
New compounds useful as constituents of liquid crystal compositions exhibiting a negative dielectric anisotropy are provided, which are 2-cyano-4-halogenophenyl esters expressed by the general formula ##STR1## wherein R represents hydrogen atom or an alkyl group or an alkoxy group of 1 to 10 carbon atoms; ##STR2## each represent either one of ##STR3## l, m and n each represent 0 or 1 and the total of l+m+n is 1, 2 or 3; X represents F or Cl; and Y and Z each represent hydrogen atom or F or Cl.
公开/授权文献
- US5097693A Continuous extrusion apparatus 公开/授权日：1992-03-24