发明授权
- 专利标题: Plasma X-ray source
- 专利标题(中): 等离子X射线源
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申请号: US772692申请日: 1985-09-05
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公开(公告)号: US4627086A公开(公告)日: 1986-12-02
- 发明人: Yasuo Kato , Yoshio Watanabe , Seiichi Murayama
- 申请人: Yasuo Kato , Yoshio Watanabe , Seiichi Murayama
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX59-186538 19840907; JPX59-196624 19840921
- 主分类号: H01J35/00
- IPC分类号: H01J35/00 ; H01J35/22 ; H05G2/00 ; H05H1/24 ; G21B1/00
摘要:
A plasma X-ray source is operable, like the plasma focus type source, to generate impulse discharge through a gas filled in a discharge tube. A relatively small amount of the gas is continuously supplied to and evacuated from the discharge tube in accordance with an occurrence frequency of discharge, without operating evacuation and filling of the gas at each cycle of discharge, under the regulation to make constant the pressure within the discharge tube, thereby eliminating the time for exchange of gas contaminated by discharge, reducing the amount of gas used, and improving reproducibility of discharge.
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