Invention Grant
- Patent Title: Intense X-ray source using a plasma microchannel
- Patent Title (中): 使用等离子体微通道的强X射线源
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Application No.: US643458Application Date: 1984-08-23
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Publication No.: US4627088APublication Date: 1986-12-02
- Inventor: Henri T. Doucet , Michel Gazaix , Henri Lamain , Claude Rouille , Jean-Pierre Furtlehner
- Applicant: Henri T. Doucet , Michel Gazaix , Henri Lamain , Claude Rouille , Jean-Pierre Furtlehner
- Applicant Address: FRX Paris FRX Paris
- Assignee: Centre National de la Recherche Scientifique,Commissariat a l'Energie Atomique
- Current Assignee: Centre National de la Recherche Scientifique,Commissariat a l'Energie Atomique
- Current Assignee Address: FRX Paris FRX Paris
- Priority: FRX8314086 19830902
- Main IPC: G21G4/04
- IPC: G21G4/04 ; G03F7/20 ; G21B1/00 ; H05G2/00 ; H05H1/00 ; H05H1/22 ; H01J35/00 ; H01J35/22
Abstract:
Intense soft X-ray source having an enclosure filled with gas and having two electrodes connected to a high voltage source, one of the electrodes having an opening. A device is provided for producing a photoionizing radiation directed through the opening. The radiation traversing the gas in the direction of the other electrode and during its passage producing a plasma microchannel, an electrical discharge supplied by the source then occurring in the microchannel, wherein the device for producing the photoionizing radiation is an auxiliary soft X-ray source.
Public/Granted literature
- US5945973A Position reader Public/Granted day:1999-08-31
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