发明授权
US4634474A Coating of III-V and II-VI compound semiconductors 失效
III-V和II-VI化合物半导体的涂层

Coating of III-V and II-VI compound semiconductors
摘要:
Proposed is a method of fabricating III-V and II-VI compound semiconductors and a resulting product where there is formed on the surface a coating which can function as a diffusion mask and/or a passivation layer. The coating is a silicon layer deposited by a method which does not damage the semiconductor surface.
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