发明授权
- 专利标题: Method for the improvement of antistatic performance of synthetic resin shaped articles
- 专利标题(中): 提高合成树脂成型制品抗静电性能的方法
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申请号: US743874申请日: 1985-06-11
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公开(公告)号: US4639379A公开(公告)日: 1987-01-27
- 发明人: Michihiko Asai , Yukio Shimura , Keishiro Tsuda , Susumu Ueno , Hirokazu Nomura , Kiyoshi Imada
- 申请人: Michihiko Asai , Yukio Shimura , Keishiro Tsuda , Susumu Ueno , Hirokazu Nomura , Kiyoshi Imada
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX56-183346 19811116
- 主分类号: C08J7/00
- IPC分类号: C08J7/00 ; B05D3/06 ; B05D7/26 ; B29C71/04 ; C08J7/04 ; C08J7/12 ; C08J7/18 ; C08K5/54 ; C08L25/04 ; C08L77/00
摘要:
The invention provides a very efficient method for the improvement of the antistatic performance, e.g. decrease in the accumulation of static electricity on the surface and decrease in the surface resistivity, of a synthetic resin shaped article with outstanding durability of the effect. The method comprises two steps in principle, first of which is the formation of a crosslinked layer in the surface portion of the shaped article by a variety of known methods effective for the formation of crosslinks in polymeric materials and the second of which is the exposure of the thus crosslinked surface of the article to low temperature plasma produced in an atmosphere containing a gaseous silicon-containing compound which may be a silane compound or a low-molecular weight vaporizable siloxane compound to form a plasma-polymerized surface film of the silicon compound on the crosslinked layer.
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