A heat developable light-sensitive material having an excellent stability with time and capable of providing a high quality image is disclosed, which contains a base precursor represented by the following general formula (I): ##STR1## wherein A represents an organic residue represented by the following formula (II): ##STR2## X represents an electron attractive substituent having a Hammett's sigma value of more than 0;l represents an integer of 1 to 5 and, when l represents 2 or more, a plurality of Xs may be the same or different;Y represents a substituent having a Hammett's sigma value of 0 or less;k represents an integer of 0 to 5 and, when k represents 2 or more, a plurality of Ys may be the same or different;Z represents a divalent organic residue selected from the group consisting of --C.dbd.C--, --O--, --S--, and --NR-- (wherein R represents a hydrogen atom or a substituent selected from the group consisting of an alkyl group, an alkenyl group, an aralkyl group, an aryl group, and an acyl group);the broken line in the general formula (II) represents that the cyclic compound containing Z may optionally be fused with a benzene ring;B represents a mono- or diacidic base having a pKa value of 7 or more and containing 12 or less carbon atoms; andn and m represent an integer of 1 or 2 and are in such relation that the number of positive charge is equal to that of negative charge.