发明授权
- 专利标题: Apparatus and method of operation for an electron beam source
- 专利标题(中): 用于电子束源的装置和操作方法
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申请号: US689932申请日: 1985-01-09
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公开(公告)号: US4651058A公开(公告)日: 1987-03-17
- 发明人: Kiyoshi Hamada , Masanori Watanabe , Kinzo Nonomura , Minoru Katsuyama , Riyuma Hirano
- 申请人: Kiyoshi Hamada , Masanori Watanabe , Kinzo Nonomura , Minoru Katsuyama , Riyuma Hirano
- 申请人地址: JPX Kadoma
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Kadoma
- 主分类号: G09G3/22
- IPC分类号: G09G3/22 ; G09G3/30 ; H01J1/13 ; H01J31/12 ; H05B39/00 ; H05B41/14
摘要:
Apparatus and method for substantially equalizing the potential drop along a line cathode used in an electron beam source adapted for use in a flat display device. The apparatus and method ensure that electrons from a power source are fed through both ends of the line cathode, substantially simultaneously. Thereby, the potential drop along the axial length of the line cathode is decreased, improving the uniformity of brightness of the display.
公开/授权文献
- US5885734A Process for modifying a hierarchical mask layout 公开/授权日:1999-03-23
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