发明授权
- 专利标题: Perpendicular magnetic recording medium, method for producing the same, and sputtering device
- 专利标题(中): 垂直磁记录介质及其制造方法以及溅射装置
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申请号: US819229申请日: 1986-01-15
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公开(公告)号: US4666788A公开(公告)日: 1987-05-19
- 发明人: Sadao Kadokura , Kazuhiko Honjo , Takashi Tomie , Masahiko Naoe
- 申请人: Sadao Kadokura , Kazuhiko Honjo , Takashi Tomie , Masahiko Naoe
- 申请人地址: JPX Osaka
- 专利权人: Teijin Limited
- 当前专利权人: Teijin Limited
- 当前专利权人地址: JPX Osaka
- 优先权: JPX57-22080 19820216; JPX57-50975 19820331
- 主分类号: G11B5/66
- IPC分类号: G11B5/66 ; G11B5/851 ; H01F1/00
摘要:
A magnetic recording medium conventionally utilizes the in-plane magnetization mode, but recently the perpendicular magnetization mode utilizing the perpendicular anisotropy of an hcp cobalt alloy layer, in which the C axis is oriented perpendicular to the layer surface, has been proposed. The known perpendicular magnetic recording medium is produced by means of RF sputtering and comprises a Permalloy layer, as layer of a low coercive-force material, between the nonmagnetic base and the hcp cobalt alloy layer. The perpendicular anisotropy attained by the present invention is very excellent and is superior to that of a perpendicular recording medium having no Permalloy layer because a Co-Ta alloy is used as the layer of a low coercive-force material.
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