发明授权
- 专利标题: Electrophotographic photosensitive member and method for making such a member
- 专利标题(中): 电子照相感光构件及其制造方法
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申请号: US820985申请日: 1986-01-21
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公开(公告)号: US4670367A公开(公告)日: 1987-06-02
- 发明人: Koji Minami , Kazuyuki Goto , Hisao Haku , Takeo Fukatsu , Michitoshi Ohnishi , Yukinori Kuwano
- 申请人: Koji Minami , Kazuyuki Goto , Hisao Haku , Takeo Fukatsu , Michitoshi Ohnishi , Yukinori Kuwano
- 申请人地址: JPX Osaka
- 专利权人: Sanyo Electric Co., Ltd.
- 当前专利权人: Sanyo Electric Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX58-112094 19830621
- 主分类号: G03G5/08
- IPC分类号: G03G5/08 ; G03G5/04 ; G03G5/082
摘要:
An electrophotographic photosensitive member has a conductive substrate, a first layer structure with a single layer made mainly of amorphous silicon formed on the substrate, and a second layer structure including multiple layers also mainly made of amorphous silicon layered in succession on the first layer structure. The plurality of second layers includes at least two high resistance layers having a relatively high resistance value and at least one low resistance layer having a relatively low resistance value compared to the high resistance value. The layers of the second layer structure are layered alternately on the first layer structure so that the first and last layers in the second layer structure are high resistance layers.
公开/授权文献
- US5820947A Plasma processing method and apparatus 公开/授权日:1998-10-13
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