发明授权
- 专利标题: Descaling process
- 专利标题(中): 除垢过程
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申请号: US763754申请日: 1985-08-06
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公开(公告)号: US4705573A公开(公告)日: 1987-11-10
- 发明人: Christopher J. Wood , David Bradbury , Timothy Swan , Michael G. Segal , Robin M. Sellers
- 申请人: Christopher J. Wood , David Bradbury , Timothy Swan , Michael G. Segal , Robin M. Sellers
- 申请人地址: CA Palo Alto
- 专利权人: Electric Power Research Institute, Inc.
- 当前专利权人: Electric Power Research Institute, Inc.
- 当前专利权人地址: CA Palo Alto
- 优先权: GBX8000584 19800108
- 主分类号: G21F9/28
- IPC分类号: G21F9/28 ; C02F5/10 ; C23G1/24 ; G21D1/00 ; G21F9/00 ; G21F9/30 ; C23G1/02 ; C23G1/08
摘要:
A process for the removal of deposits consisting essentially of the oxides of one or more transition metals from a surface, which process comprises contacting the said surface at a pH in the range of from 2.0 to 7.0 with a reagent comprising a one-electron reducing agent which is the complex formed between a low oxidation state transition metal ion and a complexing agent, for destabilizing the metal oxides deposited, thereby increasing their rate of dissolution, the complexing agent being thermally stable at the operating pH and present in order to form the necessary complex reagent and also to increase the thermodynamic solubility of the metal ions released.
公开/授权文献
- US5876597A Anionic dye-containing polymer 公开/授权日:1999-03-02
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