发明授权
- 专利标题： Axial flow plasma shutter
- 专利标题（中）： 轴流等离子体快门
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申请号： US853103申请日： 1986-04-17
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公开(公告)号： US4721891A公开(公告)日： 1988-01-26
- 发明人: George J. Krausse
- 申请人： George J. Krausse
- 申请人地址： CA Berkeley
- 专利权人： The Regents of the University of California
- 当前专利权人： The Regents of the University of California
- 当前专利权人地址： CA Berkeley
- 主分类号： H05H1/00
- IPC分类号： H05H1/00 ; H01J1/50 ; H01J17/14 ; H01J17/50
摘要：
A shutter (36) is provided for controlling a beam, or current, of charged particles in a device such as a thyratron (10). The substrate (38) defines an aperture (60) with a gap (32) which is placeable within the current. Coils (48) are formed on the substrate (38) adjacent the aperture (60) to produce a magnetic field for trapping the charged particles in or about aperture (60). The proximity of the coils (48) to the aperture (60) enables an effective magnetic field to be generated by coils (48) having a low inductance suitable for high frequency control. The substantially monolithic structure including the substrate (38) and coils (48) enables the entire shutter assembly (36) to be effectively located with respect to the particle beam.
公开/授权文献
- US6110025A Containment ring for substrate carrier apparatus 公开/授权日：2000-08-29
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