发明授权
- 专利标题: Method for imparting releasability to a substrate surface
- 专利标题(中): 赋予基材表面释放性的方法
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申请号: US848814申请日: 1986-04-04
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公开(公告)号: US4726964A公开(公告)日: 1988-02-23
- 发明人: Kenichi Isobe , Hisashi Aoki , Yasuaki Hara , Meguru Kashida , Kiyohiro Kondow
- 申请人: Kenichi Isobe , Hisashi Aoki , Yasuaki Hara , Meguru Kashida , Kiyohiro Kondow
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX60-75585 19850410
- 主分类号: C08L83/00
- IPC分类号: C08L83/00 ; C08L83/04 ; C08L83/05 ; C08L83/07 ; C09J7/02 ; D21H19/32 ; B05D3/06
摘要:
The invention provides a method for imparting releasability to the surface of a plastic film or paper by coating the surface with an organopolysiloxane composition followed by curing, in which the curing is complete by heating at a relatively low temperature and the cured surface film of the composition is very stable and free from the problem of transfer to another body in contact therewith. The composition comprises a vinyl-containing organopolysiloxane, an organohydrogenpolysiloxane and a platinum compound to catalyze the addition reaction between the silicon-bonded vinyl groups and silicon-bonded hydrogen atoms. Different from conventional organohydrogenpolysiloxane having a linear molecular structure, the organohydrogenpolysiloxane used in the invention is represented by the general unit formula (RSiO.sub.1.5).sub.m (RHSiO.sub.0.5).sub.n, in which R is a monovalent hydrocarbon group free form unsaturation and m and n are each a positive integer with the proviso that the ratio of n/m is from 0.1 to 3.0, or a combination thereof with a linear organohydrogenpolysiloxane.
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