发明授权
US4734385A Semiconductor laser element suitable for production by a MO-CVD method
失效
半导体激光元件适用于通过MO-CVD法制造
- 专利标题: Semiconductor laser element suitable for production by a MO-CVD method
- 专利标题(中): 半导体激光元件适用于通过MO-CVD法制造
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申请号: US29190申请日: 1987-03-23
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公开(公告)号: US4734385A公开(公告)日: 1988-03-29
- 发明人: Yutaka Mihashi , Yutaka Nagai
- 申请人: Yutaka Mihashi , Yutaka Nagai
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX59-49734 19840313
- 主分类号: H01S5/00
- IPC分类号: H01S5/00 ; H01S5/223 ; H01L21/208 ; H01S3/19
摘要:
A semiconductor laser element includes a first cladding layer of first conductivity type provided on a semiconductor substrate of the first conductivity type; a current blocking layer of a second conductivity type provided on the first cladding layer having a stripe groove from which the first cladding layer and is exposed at the bottom thereof; a light guide layer of the first conductivity type provided covering the current blocking layer, the stripe groove, and the first cladding layer exposed from the groove; an active layer provided on the light guide layer curved in the neighborhood of the stripe groove, whose refractive index is larger than that of the light guide layer; and a second cladding layer of the second conductivity type provided on the active layer, whose refractive index is smaller than that of the active layer.
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