发明授权
- 专利标题: Imide derivatives and compositions for use as antipsychotic agents
- 专利标题(中): 用作抗精神病药的酰亚胺衍生物和组合物
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申请号: US844528申请日: 1986-03-27
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公开(公告)号: US4745117A公开(公告)日: 1988-05-17
- 发明人: Kikuo Ishizumi , Fujio Antoku , Isamu Maruyama , Atuyuki Kojima
- 申请人: Kikuo Ishizumi , Fujio Antoku , Isamu Maruyama , Atuyuki Kojima
- 申请人地址: JPX Osaka
- 专利权人: Sumitomo Pharmaceuticals Company, Limited
- 当前专利权人: Sumitomo Pharmaceuticals Company, Limited
- 当前专利权人地址: JPX Osaka
- 优先权: JPX60-62796 19850327; JPX60-62797 19850327; JPX60-62798 19850327; JPX60-139813 19850625; JPX60-163485 19850723; JPX60-177980 19850813
- 主分类号: C07D209/48
- IPC分类号: C07D209/48 ; A61K31/425 ; A61K31/428 ; A61K31/435 ; A61K31/495 ; A61P25/00 ; A61P25/18 ; A61P25/20 ; C07D209/76 ; C07D275/06 ; C07D405/06 ; C07D417/12 ; C07D491/18 ; C07D417/14
摘要:
A compound of the formula: ##STR1## wherein A is a carbonyl group or a sulfonyl group;B is either one of the formulas: ##STR2## (in which E is a methylene group, an ethylene group or an oxygen atom and a full line accompanying a broken line ( ) indicates a single bond or a double bond), ##STR3## (in which F is a methylene group or an ethylene group and a full line accompanying a broken line ( ) is as defined above) and ##STR4## (in which R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are each a hydrogen atom or a methyl group) when A represents a carbonyl group, or B is a 1,2-phenylene group when A represents a sulfonyl group;D is an ethylene group, an ethenylene group or an ethynylene group, of which one or more may be optionally substituted with hydroxyl; andn is an integer of 0, 1 or 2, or its acid addition salt. These compounds are useful for the treatment or psychosis.
公开/授权文献
- US6061473A Compression and expansion methods and apparatus 公开/授权日:2000-05-09
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