发明授权
- 专利标题: Method of manufacturing heterojunction bipolar transistors
- 专利标题(中): 异质结双极晶体管的制造方法
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申请号: US48470申请日: 1987-05-08
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公开(公告)号: US4746626A公开(公告)日: 1988-05-24
- 发明人: Kazuo Eda , Masanori Inada , Yorito Ota
- 申请人: Kazuo Eda , Masanori Inada , Yorito Ota
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX60-136402 19850621; JPX60-136405 19850621; JPX60-136409 19850621; JPX60-137261 19850624
- 主分类号: H01L21/331
- IPC分类号: H01L21/331 ; H01L29/73 ; H01L29/737 ; H01L21/203
摘要:
A heterojunction bipolar transistor having excellent high-frequency characteristics is manufactured by forming a semi-insulating semiconductor layer on a collector (or emitter) layer, removing a part of the semi-insulating semiconductor layer to form a cut portion so that the collector layer is exposed at the cut portion, growing a base layer on the semi-insulating semiconductor layer, on a slant wall of the cut portion and on the exposed part of the collector layer, and growing an emitter (or collector) layer on the base layer. A base layer may be preliminarily formed on the semi-insulating semiconductor layer before forming the cut portion. Energy band gap of the emitter is greater than that of the base.
公开/授权文献
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