发明授权
- 专利标题： Monolithically integrated WDM demultiplex module and method of manufacture of such module
- 专利标题（中）： 单片集成WDM解复用模块及其制造方法
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申请号： US813954申请日： 1985-12-27
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公开(公告)号： US4747649A公开(公告)日： 1988-05-31
- 发明人: Jochen Heinen , Hans F. Mahlein , Reinhard Marz , Manfred Plihal , Heinrich Schlotterer , Gerhard Winzer , Ulrich Wolff
- 申请人： Jochen Heinen , Hans F. Mahlein , Reinhard Marz , Manfred Plihal , Heinrich Schlotterer , Gerhard Winzer , Ulrich Wolff
- 申请人地址： DEX Berlin & Munich
- 专利权人： Siemens Aktiengesellschaft
- 当前专利权人： Siemens Aktiengesellschaft
- 当前专利权人地址： DEX Berlin & Munich
- 优先权： DEX3500206 19850707
- 主分类号： G02B6/12
- IPC分类号： G02B6/12 ; G02B6/34 ; G02B6/42 ; H01L31/102 ; G02B6/10
摘要：
A monolithically integrated WDM demultiplex module has a film wave guide of InGaAsP fashioned on a substrate, a photodiode of InGaAs being applied to the film wave guide. The photodiode is optically coupled to the film wave guide by a leakage coupling. A wavelength selection element in the form of a grating is provided in the surface of the film wave guide. The module can be manufactured with a single epitaxial step. Structures for increasing the crosstalk attenuation of the module and for a better coupling-in of radiation into the module are provided.
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