发明授权
- 专利标题: Molecular beam source
- 专利标题(中): 分子束源
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申请号: US5846申请日: 1987-01-21
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公开(公告)号: US4748315A公开(公告)日: 1988-05-31
- 发明人: Kunihiro Takahashi , Kazumasa Fujioka , Naoyuki Tamura
- 申请人: Kunihiro Takahashi , Kazumasa Fujioka , Naoyuki Tamura
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX61-10516 19860121
- 主分类号: H01L21/203
- IPC分类号: H01L21/203 ; C23C14/24 ; C23C14/26 ; C30B23/00 ; F27D99/00 ; H05B3/64
摘要:
A molecular beam source suppresses a temperature fall at the opening of a crucible, to make a temperature distribution within the crucible uniform and to prevent the phenomenon of bumping of a source substance, whereby the quality of an evaporated film can be enhanced. The source includes a heater disposed around the crucible which is formed of straight parts and U-shaped end parts continuously repeated at equal intervals. The straight parts are arranged so as to extend in a vertical direction of the crucible and the U-shaped end parts are bent outwards at outer-peripheral positions of the opening of the crucible.