- 专利标题: System for measuring foreign materials in liquid
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申请号: US14787申请日: 1987-02-13
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公开(公告)号: US4779451A公开(公告)日: 1988-10-25
- 发明人: Masayoshi Ezawa , Shigeru Wakana , Akira Misumi , Yoshifumi Tomita , Yutaka Hiratsuka
- 申请人: Masayoshi Ezawa , Shigeru Wakana , Akira Misumi , Yoshifumi Tomita , Yutaka Hiratsuka
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX61-30811 19860217; JPX61-30812 19860217; JPX61-30813 19860217
- 主分类号: G01N29/036
- IPC分类号: G01N29/036 ; G01N15/00 ; G01N15/06 ; G01N21/05 ; G01N21/85 ; G01N15/07
摘要:
A system for measuring a foreign material in a liquid, includes a sampling section, vacuum deaerators, foreign material measuring sensors. The sampling section prepares a sample liquid containing various foreign materials having particles of different sizes and numbers and a calibration standard liquid containing particles of known sizes and numbers. The vacuum deaerators deaerate gases mixed in the sample and calibration standard liquids. The sensors detect the foreign materials in the deaerated liquids. These sensors are arranged in front of the deaerators, respectively.
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