发明授权
- 专利标题: Apparatus for depositing mono-molecular layer
- 专利标题(中): 用于沉积单分子层的装置
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申请号: US25253申请日: 1987-03-12
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公开(公告)号: US4779562A公开(公告)日: 1988-10-25
- 发明人: Yoshinobu Ono
- 申请人: Yoshinobu Ono
- 申请人地址: JPX Kanagawa
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX61-61274 19860319; JPX61-90348 19860418; JPX61-142539 19860618
- 主分类号: B05C3/02
- IPC分类号: B05C3/02 ; B05C3/109 ; B05D1/20 ; G03F7/16 ; B05C3/18
摘要:
An apparatus for depositing a mono-molecular layer on a substrate surface comprises first and second containers which contain a liquid and are connected via a connecting passage, and a pressure applying mechanism for applying pressure on the liquid in the second container. A mono-molecular layer is formed at the liquid surface of the liquid in the first container, and the mono-molecular layer is deposited on the substrate surface by controlling the pressure applying mechanism so that the liquid surface of the first container rises and falls with respect to the substrate which is essentially stationary.
公开/授权文献
- US4216210A Fortimicins AM and AP derivatives 公开/授权日:1980-08-05
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