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US4780396A Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant 失效
用于含有锂和钾盐和阴离子表面活性剂的中性pH的平版印刷版的无机溶剂显影剂组合物

Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant
摘要：
An organic solvent free developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture:(a) from about 0.1% to about 20% by weight of the developer of one or more compounds selected from the group consisting of sodium octyl sulfate, sodium tetradecyl sulfate, sodium 2-ethyl hexyl sulfate and ammonium lauryl sulfate; and(b) from about 0.1% to about 30% by weight of the developer of one or more components selected from the group consisting of lithium salts of hydroxy, aryl and alkyl carboxylic acids; and(c) from about 0.1% to about 30% by weight of the developer of one or more compounds selected from the group consisting of potassium salts of hydroxy, aryl and alkyl carboxylic acids; and(d) an optional compatible organic or inorganic acid or base in an amount sufficient to adjust the pH of the developer composition into the range of from about 6.5 to about 7.5; and(e) an optional anti-foam component in an amount of from about 0.02 to about 0.05% by weight of the developer; and(f) sufficient water to formulate an effective developer.
摘要（中）：

一种具有约6.5至约7.5范围内的pH的无机溶剂显影剂组合物，其包含：（a）约0.1％至约20％重量的一种或多种选自以下的化合物的显影剂： 辛基硫酸钠，十四烷基硫酸钠，2-乙基己基硫酸钠和月桂基硫酸铵; 和（b）约0.1％至约30％重量的选自羟基，芳基和烷基羧酸的锂盐的一种或多种组分的显色剂; 和（c）约0.1％至约30％重量的一种或多种选自羟基，芳基和烷基羧酸的钾盐的化合物的显影剂; 和（d）任选相容的有机或无机酸或碱，其量足以将显影剂组合物的pH调节至约6.5至约7.5; 和（e）任选的抗泡沫组分，其量为显影剂重量的约0.02至约0.05％; 和（f）足够的水来配制有效的显影剂。

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