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US4783235A Method for growing a single crystal of compound semiconductor 失效
生长化合物半导体单晶的方法

Method for growing a single crystal of compound semiconductor
摘要:
An improvement of LEC methods. Highly impurity doped single crystal often suffers from impurity precipitation. The cause of the occurrence of impurity precipitation is supposed to be the supercooling. To avoid the occurrence of supercooling the pulling speed is slowly lowered during the crystal growth in the LEC methods. The beginning of the occurrence of impurity precipitation is delayed by lowering the pulling speed. Additional application of magnetic field is more effective.
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