发明授权
- 专利标题： Thin film magnetic head with an application type silicon dioxide film
- 专利标题（中）： 薄膜磁头与应用型二氧化硅薄膜
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申请号： US855934申请日： 1986-04-25
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公开(公告)号： US4789910A公开(公告)日： 1988-12-06
- 发明人: Kozi Otsuka , Tohru Kira , Kazuyoshi Imae , Mitsuhiko Yoshikawa
- 申请人： Kozi Otsuka , Tohru Kira , Kazuyoshi Imae , Mitsuhiko Yoshikawa
- 申请人地址： JPX Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JPX Osaka
- 优先权： JPX60-91667 19850426; JPX60-91668 19850426
- 主分类号： G11B5/39
- IPC分类号： G11B5/39 ; G11B5/30 ; G11B5/12
摘要：
A thin film magnetic head which comprises an end portion of a first yoke and an end portion of a second yoke confronting each other through a magnetic gap, and receiving from a recording surface or a recording medium, a magnetic signal, and a magnetic reluctance effect element disposed for magnetic coupling in the course of a magnetic path constituted by the first and second yokes. The thin film magnetic head is characterized in that the first yoke or magnetic reluctance effect element is formed on an application type SiO.sub.2 film which improves the surface roughness of the ground layer.
公开/授权文献
- USD340610S Tool holder assembly 公开/授权日：1993-10-26
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