发明授权
- 专利标题: Dual-wavelength spectrophotometry system
- 专利标题(中): 双波长分光光度法
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申请号: US23567申请日: 1987-03-09
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公开(公告)号: US4795256A公开(公告)日: 1989-01-03
- 发明人: Andrew W. Krause , Charles G. Marianik , Ronald J. Kovach
- 申请人: Andrew W. Krause , Charles G. Marianik , Ronald J. Kovach
- 申请人地址: NJ Princeton
- 专利权人: Photon Technology International, Inc.
- 当前专利权人: Photon Technology International, Inc.
- 当前专利权人地址: NJ Princeton
- 主分类号: G01J3/427
- IPC分类号: G01J3/427 ; G01J3/44 ; G01J3/08 ; G01N21/64
摘要:
A dual wavelength spectrophotometer produces a relatively small, high power, high duty cycle light spot from a single relatively low power multi-chromatic light source. A Xenon arc lamp light source is focused by an ellipsoidal mirror onto a rotating partially reflective optical chopper. The chopper comprises a wheel having mirrored segments alternately separated by transparent segments. Light reflected by the mirrored segments passes through a first monochromator which produces a first monochromatic light beam. Light transmitted through the transparent segments passes through a second monochromator and emerges as a second monochromatic light beam having a wavelength different from the wavelength of said first monochromatic light beam. The first and second monochromatic light beams are recombined into a single dual wavelength light beam that is reflected through a sample to be analyzed. Reflective front surfaces are employed throughout the system in order to minimize power loss.
公开/授权文献
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